Abstract:

Thin film interference is an important content in the teaching of wave optics in University Physics，

and it is also the theoretical basis of thin film optics. One of the most important applications of thin film interference

is to design antireflection and high reflection coatings. Reflectance of multilayer dielectric film is quantitatively calculated

based on transfer matrix method in the manuscript. The reflectance of the one BK7 glass surface without

coatings is about 4% over the visible spectrum; Low reflectance can be obtained by destructive interference of the

thin film. The reflectance of single antireflection coating on glass decreases to 1.3% at the designed wavelength，

550nm. However，performance of such quarter-wave coatings falls off when deviating from the designed wavelength.

The reflectance of double antireflection coatings on glass maintains low reflectance，less than 1.3%，over the 470～

670 nm wavelength range. On the contrary，high reflectance can be obtained by constructive interference of the thin

film. The reflectance of fused quartz can be increased from 3.3% for the bare surface to 30% for the single layer

high reflection coating at the designed wavelength，1500nm. The reflectance of the seven groups of films can reach

more than 99% over the 1360 ～ 1660 nm wavelength range. Through these quantitative calculations，students can

have a deeper understanding of the application of theoretical knowledge in practice，cultivate their engineering

awareness and enhance their interest in learning.

Key words: thin film interference, transfer matrix method, anti-reflection coating, high reflection coating